Plasma App Ltd are the creators of the VCD (virtual cathode deposition) thin film manufacturing technique. VCD is novel and disruptive vacuum plasma deposition technology with a growing range of applications. Benefits include: –
• Allows the deposition of any material on any substrate, such as transparent conductive films on plastics and other fragile substrates.
• Very high deposition rates, even for complex materials.
• Low capital equipment and running costs.
• Easily scalable from lab R&D systems to large scale industrial deposition processes.
If you have a thin film deposition problem to solve, then contact us for a demonstration.


R79, Rutherford Appleton Laboratory

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